Applied Materials Centura 5200 (S/N: C045)
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- 200mm wafer size
- Number of chambers: 3
- Process capability: CVM/Anneal and PVD
- Chamber 1: CVD with liquid delivery system and vaporizer
- Chamber 2: PVD
- Chamber 3: MAC – Anneal
- Controller type: VME
- Reduced Pressure: Yes
- External cooling: Water cooled
- Accessories:
- Degas Chamber
- Orientor chamber
- Heat exchanger (two)
- MAC Blower
- RF Generator Rack
- Cryo compressor (two)
- System cables
- Monitors (two)
- Process Gases: N2, O2, Ar, N20, H2/N2, and NH3
- CVD ampoules include: Octane and 2 proprietary precursors
- Vintage: 1994
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